SPIE Advanced Lithography + Patterning 2025

SPIE Advanced Lithography + Patterning 2025

February 23 – 27

San Jose, California 

DuPont is proud to sponsor SPIE Advanced Lithography + Patterning 2025. Join us at our technical presentations to learn from our experts on the latest developments in advanced lithography and extreme ultraviolet (EUV) materials.

Monday, February 24

Next-Generation EUV Photoresists based on Chain-Unzipping Polymers

1:40 PM - 2:00 PM PST | Rachel Snyder | Paper 13428-5

Tuesday, February 25

Defect Enhancement of EUV Photoresists Through Careful Tuning of Polymer Hydrophobicity and Homogeneity

10:30 AM - 10:50 AM PST | Benjamin Naab | Paper 13428-16

Wednesday, February 26

PFAS Substitution in Photolithography Materials: Strategies and Progress

8:20 AM - 8:40 AM PST | Quizhe (Ben) Xie | Paper 13428-33
 

The Development of Non-Fluorinated (Non-PFAS) KrF Photoresists

5:30 PM - 7:00 PM PST | Cong (Colin) Liu | Paper 13428-75
 

Effect of Composition Uniformity in the Polymer Chain of EUV Photoresist on Lithographic Performance

4:45 PM – 5:05 PM PST | Euijin Ko | Paper 13428-51

Thursday, February 27

Exploring Advanced Chemically Amplified EUV Resist Through Novel Materials Design Strategies

9:10 AM – 9:30 AM PST | Emad Aqad | Paper 13428-56
 

Consideration on Segregation Behavior of The Surface Localization Material and The Pattern Roughness Degradation in EUV Lithography

10:20 AM – 10:40 AM PST | KwangMo Choi | Paper 13428-43

Poster Session: Wednesday, February 26 | 5:30 PM – 7:00 PM PT

Embedded Barrier Layer (EBL) Development for High Scan Speed ArF Immersion Application

Jingyi Li | Paper 13428-95
 

Physical Property and Matrix Effect Impact on Non-fluorinated Photoacid Generator Performance

Paul LaBeaume | Paper 13428-70
 

Removal Behavior for Metallic Contaminants on EUV Mask by The Damage-free Wet Solution

Bong-Kyun Kang | Paper 13428-81
 

New Molecular Resist Eesign for Advanced Patterning

Vageesha Liyanam Gunawardana | Paper 13428-84
 

Novel PAG Bound Polymers for High Resolution EUV Applications

Yongqiang Zhang | Paper 13428-106
 

New Photoacid Generators Design for Advanced EUV Patterning

Kamal P. Pandey | Paper 13428-82

For more information and connect with DuPont while at SPIE, please contact us here.

To learn more about the DuPont lithography materials that support advanced patterning, read about our portfolio of advanced overcoats.

For more information about SPIE, please visit the SPIE Advanced Lithography + Patterning website.

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